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ViennaTS
The Vienna Topography Simulator
...The tool supports several etching and deposition models, essential for the understanding of process-induced phenomena in micro- and nanoelectronics. The model support includes but is not limited to silicon etching in SF6/O2 and HBr/O2 plasmas, silicon dioxide etching in CF4 plasma, anisotropic wet etching of silicon, CFx polymer deposition on silicon, as well as several adaptable deposition models. ViennaTS is currently in a prototype state; the development is done on GitHub: https://github.com/viennats/viennats-dev
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